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Annual Review of Chemical and Biomolecular Engineering

Volume 7, 2016

Advances in Nanoimprint Lithography

Abstract

Nanoimprint lithography (NIL), a molding process, can replicate features <10 nm over large areas with long-range order. We describe the early development and fundamental principles underlying the two most commonly used types of NIL, thermal and UV, and contrast them with conventional photolithography methods used in the semiconductor industry. We then describe current advances toward full commercial industrialization of UV-curable NIL (UV-NIL) technology for integrated circuit production. We conclude with brief overviews of some emerging areas of research, from photonics to biotechnology, in which the ability of NIL to fabricate structures of arbitrary geometry is providing new paths for development. As with previous innovations, the increasing availability of tools and techniques from the semiconductor industry is poised to provide a path to bring these innovations from the lab to everyday life.

Keyword(s): J-FIL, Jet and Flash Imprint Lithography, nanofabrication, thermal NIL, UV-curable nanoimprint lithography, UV-NIL
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/content/journals/10.1146/annurev-chembioeng-080615-034635
2016-06-07
2024-04-24
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/content/journals/10.1146/annurev-chembioeng-080615-034635
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Advances in Nanoimprint Lithography
Annual Review of Chemical and Biomolecular Engineering 7, 583 (2016); https://doi.org/10.1146/annurev-chembioeng-080615-034635
/content/journals/10.1146/annurev-chembioeng-080615-034635
/content/journals/10.1146/annurev-chembioeng-080615-034635
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