1932

Abstract

The evolution of ferroelectric devices is driven by advancements in materials science, device physics, and engineering. However, depolarization fields and interfacial disorder limit the scaling performance, endurance, and reliability of conventional thin-film ferroelectrics. van der Waals (vdW) ferroelectric materials exhibiting novel properties at the atomic scale are interesting candidates for mitigating the aforementioned issues, thereby allowing for improved ferroelectric device performance. In this review, we discuss the unconventional origins of both spontaneous and artificial polarization, along with their associated switching mechanisms, in polar and nonpolar vdW ferroelectric crystals and heterostructures. Recent device architectures utilizing vdW ferroelectricity are reviewed with a specific focus on emerging memory, steep-slope logic, and in-memory computing applications. We conclude with an overview of the opportunities and challenges for vdW ferroelectrics related to scalability, endurance, device integration, and growth, highlighting recent advances toward manifesting next-generation electronics.

Loading

Article metrics loading...

/content/journals/10.1146/annurev-matsci-080323-034918
2025-03-27
2025-04-27
Loading full text...

Full text loading...

/content/journals/10.1146/annurev-matsci-080323-034918
Loading
  • Article Type: Review Article
This is a required field
Please enter a valid email address
Approval was a Success
Invalid data
An Error Occurred
Approval was partially successful, following selected items could not be processed due to error