1932

Abstract

This review of materials development for optical lithography covers two areas: materials for optical steppers and scanners, and materials for EUV lithography. In the former, materials development for advanced immersion lenses and for high-index immersion lens is discussed, whereas in the latter, materials used in multilayer EUV mirrors and to generate EUV photons are discussed.

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/content/journals/10.1146/annurev-matsci-082908-145309
2009-08-04
2024-06-13
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  • Article Type: Review Article
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