Patterning ferroelectric domains to engineer devices is a relatively recent phenomenon. It is practiced on nonlinear optical materials to make micrometer-sized devices and on perovskite-based thin crystals to progress toward memory devices. Such patterning forms the basis of lithographic processing of heterogeneous nanostructures on thin-film oxides and polymers. The fundamental aspects of polarization switching relevant to patterning are summarized, after which the most common methods of patterning ferroelectric compounds are reviewed, with an emphasis on poling mechanisms for each case. Issues related to the stability of domain patterns and limitations on the smallest domain size are discussed. Finally, lithography based on ferroelectric patterning is demonstrated for a number of complex systems.


Article metrics loading...

Loading full text...

Full text loading...


Data & Media loading...

  • Article Type: Review Article
This is a required field
Please enter a valid email address
Approval was a Success
Invalid data
An Error Occurred
Approval was partially successful, following selected items could not be processed due to error